In order to understand the plasma behaviour and for optimizing plasma processes, simulations are of. Modeling capacitively coupled plasma with the comsol software. A capacitively coupled plasma ccp is one of the most common types of industrial plasma sources. In particular, for large area plasma enhanced chemical vapour deposition pecvd, the parallel. In this model, electrodes upper and lower and plasma are divided into small elements of length. Plasma will be generated in the space between the upper and lower electrodes. Vsim for plasma discharges is stateoftheart kinetic modeling software. The 1d capacitively coupled plasma discharge example is accessed from within vsimcomposer by the following actions. Vsim can model plasma thrusters, including ion thrusters and hall thrusters. Introduction capacitively coupled plasmas ccps operated at. Plasma etching and deposition of thin films are critical processes in the manufacture of advanced microelectronic devices. Simulation of inductively coupled plasma with applied bias.
Ccp reactor for semiconductor materials processing may 1st, 2017. Comparison of plasma parameters in ccp and icp processes. Validation studies using elk and the opensource moose. Pic simulations of capacitively coupled oxygen rf discharges. Capacitively coupled plasmas capacitively coupled plasmas have been used since 1975 for anisotropic reactive ion etching rie. Related content modeling of low pressure plasma sources for microelectronics fabrication. Analyzing electromagnetic systems and processes that encompass static and lowfrequency ranges requires a powerful and flexible simulation tool. In order to understand the plasma behaviour and for optimizing plasma processes, simulations are of growing interest. Select the new from example menu item in the file menu in the resulting examples window expand the vsim for plasma discharges option expand the capacitively coupled plasmas option select 1d capacitive plasma chamber and press the choose. Consistent simulation of capacitive radiofrequency. Multiphysics simulations can be used to assist with the development of. Plasma sources science and technology selfconsistent simulation of very high frequency capacitively coupled plasmas to cite this article. Inductively coupled plasma icp argon discharge with additional rf bias on the electrode is studied numerically and compared with experimental data. Simulation of discharge characteristics of capacitively coupled plasma article in zhenkong kexue yu jishu xuebaojournal of vacuum science and technology 356.
The voltage u is assumed to be constant within the elements. A twodimensional 2d selfconsistent fluid simulation of dual frequency capacitively coupled radio discharges of helium plasma is presented. In this paper, a numerical simulation model was developed to simulate the plasma in a dual frequency capacitively coupled plasma reactor based on a twodimensional, selfconsistent fluid model. In fact, sjodin suggests that these simulations couldnt be performed natively in. Simulaiton of the dual frequency capacitively coupled ar. As part of the overviz simulation suite, it can be fully coupled with electromagnetic, fluid flow, and kinetic particle models to provide solutions to a. The webinar includes a demonstration of the method, which computes the periodic steadystate solution faster than traditional methods. The simulation model includes blocking capacitor and external circuit effects.
Inductively coupled plasma simulation software emre turkoz, murat celik bogazici university, bebek, istanbul, 34342, turkey abstract an inhouse code is developed to simulate the inductively coupled plasma icp, focusing on the discharge chamber of a radiofrequency rf ion thruster. This example demonstrates the capability of vizglow for simulation of capacitively coupled plasma ccp reactors used in semiconductor manufacture. This is a repository copy of experimental benchmark of kinetic simulations of capacitively coupled. This model was setup to consist of four coupled physics. The effects of electrode shapes on the plasma properties of capacitively coupled rf argon discharge at. The current activities mostly center around software for studying high frequency plasma phenomenon for which electron kinetics is important. As part of the overviz simulation suite, it can be fully coupled with electromagnetic, fluid flow, and kinetic particle models to provide solutions to a wide range of complex multiphysics problems. Capacitively coupled plasma analysis comsol multiphysics. In a ccp reactor, the plasma is sustained by applying a sinusoidal. Therefore, these modes in a capacitively coupled discharge consist of surface waves. Characterization of capacitively coupled radiofrequency.
We would also appreciate receiving copies of your input files. The numerous chemical species and reactions, the often incomplete physical data for many species and the highly nonlinear behavior of plasmas are a few of. Vsimpd simulates capacitively coupled plasma discharge chambers. Previous validation efforts focused on simulating standard waveguide and antenna benchmarks in vacuum and linear dielectrics, but elk has since been coupled with the moosebased plasma fluid application zapdos lindsay et al 2016 j. Plasma software model lowtemperature plasma sources and. Vizglow is a robust, industrial simulation tool for highfidelity modeling of nonequilibrium plasma discharges.
The aim of our work is to provide estimates of the main discharge and plasma. Simulation simulations were performed using a purposely modi. Capacitively coupled plasma ccp discharges in parallelplate configuration are commonly used in semiconductor and other materials processing applications. The simulation results prove that the bulk position and density profiles of positive ions, negative ions, and electrons have a clear dependence on geometric asymmetry effect. Besides homebrew codes, simulation software available. Voltage distribution over capacitively coupled plasma. Kinetic simulation of capacitively coupled plasmas driven.
Simulation of main plasma parameters of a cylindrical. General information our practice has been to make all software developed by ptsg freely available to anyone. Vsim for plasma discharges can be used in the design cycle for plasma discharge and gaseous electronics devices. The model solves the continuity equations for charged species and the electron energy balance equation, coupled with poissons equation by finite element method, using comsol multiphysics software. A typical ccp system is driven by a single radiofrequency rf power supply, typically at.
For instance, the 1d and 2d capacitively coupled plasma discharge chamber examples are useful starting points for modeling a ccp, as is the turner case 2 example. Electron density in capacitively coupled plasma as one might expect, the complexities of plasma physics present considerable impediments to the development of computational plasma models. Comsol, the leading provider of software solutions for multiphysics modelling and simulation, today made available the latest release of the comsol multiphysics and comsol server products. If a rf bias power is capacitively coupled to the icp chamber, ion energy can be controlled independently of the plasma density, illustrated by the fact that icp chambers with bias power are widely used. Experimental reaction rates and crosssectional collision data for the simulation was. Dual frequency capacitively coupled plasma dfccp tools for etching and deposition for microelectronics fabrication typically use a high frequency hf, tens to hundreds of mhz to sustain the plasma and a low frequency lf, a few to 10mhz for ion acceleration into the wafer. Simulation of discharge characteristics of capacitively. The currents flowing into and out from the element are shown by the arrows in figure figure1. The nist gaseous electronics conference has provided a platform for studying capacitively coupled plasma ccp reactors, which is what this application is based upon. Low temperature radio frequency plasma is widely used in low temperature plasma processing medium for material processing in many fields including microelectronics, aerospace, and the biology.
The rfdischarge of the capacitivelycoupled plasma ccp, widely used in filmgrowth andor ionetching for integrated circuits ic fabrication, was approximated, modeled, analyzed, and simulated. From shape memory alloy sma material models to a revolutionary method for capacitively. Radiofrequency capacitively coupled plasmas in hydrogen. Index terms rf capacitive discharge, plasma reactor simulation, helium, dual frequency, comsol multiphysics software. The aims of this paper is to investigate the control of plasma properties via the geometrical asymmetry effect in a capacitive coupled discharge used for polymer processing. For proper utilization of the process, it is very much important to know the plasma parameters. Numerical simulation of an rf asymmetric nonthermal plasma. The rich set of examples accompanying vsim for plasma discharges reduces your learning curve and enables you to obtain immediate results in plasma discharge simulation. Pdf simulation of main plasma parameters of a cylindrical. An inductively coupled plasma icp or transformer coupled plasma tcp is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by timevarying magnetic fields. Introduction capacitively coupled plasma ccp reactors are widely used in plasma processing. Simulation software for strongly coupled plasma sbir. A 2d fluid simulation of a capacitively coupled radio frequency rf electrothermal plasma microthruster has been performed using the cfdace package for a preliminary analysis of the localized.
Overview of vizglow nonequilibrium plasma simulation. Endpoint detection of polymer etching using langmuir probes abstract. Traditionally, simulating these industrial plasma sources was tricky. In a ccp reactor, the plasma is sustained by applying a sinusoidal electrostatic potential across a small gap filled with a low pressure gas typically 1 torr and in this case, the gas is argon. If you use our codes or our graphics both are ed, then please acknowledge ptsg in your publications and send us a copy of your journal articles or reports send to prof. Simulation of a large size inductively coupled plasma generator and. A twodimensional axisymmetric inductively coupled plasma icp model with its implementation in the comsol multiphysics simulation software platform is described. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric description. Plasma simulation software package for law pressure 2. Lowpressure capacitively coupled plasmas are now widely used for plasma processing in the semiconductor technique.
In this archived webinar, learn how to model capacitively coupled plasma ccp using a computational method available as of version 5. Computational fluid dynamics cfd simulations of a radiofrequency. Modeling of dual frequency capacitively coupled plasma. Vsim for plasma discharges physics simulation software. These discharges provide a compact platform in which a plasma can be generated to process a flat wafer surface.
Comparison in plasma parameters was also made between a capacitively coupl ed plasma ccp and an inductively coupled plasma icp. Simulation of capacitively coupled plasma ccp in cf4 for dielectric etch with fluid flow effects description. Consistent simulation of capacitive radiofrequency discharges and. Specifically, a large size icp generator filled with argon is simulated in this study.
Boundary element method for acoustics and electromagnetics. The operating principle of a capacitively coupled plasma is different when compared to the inductive case. The langmuir probe used in plasma etching applications. Capacitively coupled plasma how is capacitively coupled. It simulates satellite surface charging and dielectric barrier discharges. Pdf computational fluid dynamics cfd simulations of a radiofrequency. The ucla plasma simulation group has an extensive history in developing and using pic software. In this paper a novel technique is used to determine the plasma parameters from the electrical discharge. The ability of vizglow for the simulation of large reactive. A geometrically symmetric equal electrode areas, capacitively coupled parallelplate plate separation 6cm argon plasma. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. Altasim technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma ccp.
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